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Turnkey
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Nikon stepper NSR2205 i14
- Wafer size: 150mm or 200mm , Flat and notch wafers
- Resolution: 0.35um
- Focus Repeatability: within 0.08um (3σ)
- Distortion: Within+/-0.04um
- ORT: Within +/-0.1 sec
- Uniformity: less than <1.5%
- Intensity: More than 650 mw/cm2
- Reticle blind: 0.4mm~0.8mm (on reticle)
- Wafer flatness: Within 2.5um
- Stepping: 3σ within 0.03um
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Nikon stepper NSR2205 i12
- Wafer size: 50mm,100mm ,150mm or 200mm , Flat and notch wafers
- Resolution: 0.35um
- Focus Repeatability: within 0.15um (3σ)
- Distortion: Within+/-0.04um
- ORT: Within +/-0.1 sec
- Uniformity: less than <1.5%
- Intensity: More than 600 mw/cm2
- Reticle blind: 0.4mm~0.8mm (on reticle)
- Wafer flatness: Within 2.5um
- Stepping: 3σ within 0.04um
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Nikon stepper NSR2205 i11
- Wafer size: 50mm,100mm ,150mm or 200mm , Flat and notch wafers
- Resolution: 0.4um
- Focus Repeatability: within 0.15um (3σ)
- Distortion: Within+/-0.045um
- ORT: Within +/-0.1 sec
- Uniformity: less than <1.5%
- Intensity: More than 600 mw/cm2
- Reticle blind: 0.4mm~0.8mm (on reticle)
- Wafer flatness: Within 2.5um
- Stepping: 3σ within 0.05um
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Nikon stepper NSR2005 i10
- Wafer size: 50mm,100mm ,150mm or 200mm , Flat and notch wafers
- Resolution: 0.45um
- Depth of focus: <0.6um
- Distortion: Within+/-0.6um
- ORT: Within +/-0.1 sec
- Uniformity: less than <1.5%
- Intensity: More than 550 mw/cm2
- Reticle blind: 0.4mm~0.8mm (on reticle)
- Wafer flatness: Within 2.5um
- Stepping: 3σ within 0.065um
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Nikon stepper NSR2005 i9
- Wafer size: 50mm,100mm ,150mm or 200mm , Flat and notch wafers
- Resolution: 0.5um
- Depth of focus: <0.6um
- Distortion: Within+/-0.65um
- ORT: Within +/-0.15 sec
- Uniformity: less than <1.5%
- Intensity: More than 500 mw/cm2
- Reticle blind: 0.4mm~0.8mm (on reticle)
- Wafer flatness: Within 2.5um
- Stepping: 3σ within 0.065um
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Nikon stepper NSR2005 i8
- Wafer size: 50mm,100mm ,150mm or 200mm , Flat and notch wafers
- Resolution: 0.5um (8 inch wafer)
- Depth of focus: <0.6um
- Distortion: Within+/-0.07um
- ORT: Within +/-0.2 sec
- Uniformity: less than <2%
- Intensity: More than 500 mw/cm2
- Pre-alignment accuracy: 3sigma<5um
- Wafer flatness: within +/-1.5sec
- Stepping: 3σ within 0.07um
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Nikon stepper NSR1755 i7
- Wafer size: 50mm,100mm ,150mm or 200mm , Flat and notch wafers
- Resolution: 0.55um (8 inch wafer)
- Depth of focus: <0.6um
- Distortion: Within+/-0.08um
- Astigmatism: less than 2.0 μm
- Uniformity: less than <2%
- Intensity: More than 500 mw/cm2
- Pre-alignment accuracy: 3sigma<5um
- Chip leveling (accuracy): within +/-1.5sec
- Stepping: 3σ within 0.08um
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